Quantum well state of self-forming 3C−SiC inclusions in 4H SiC determined by ballistic electron emission microscopy

Ding, Y. and Park, Han Bi and Pelz, J. P. and Palle, K. C. and Mikhov, M. K. and Skromme, B. J. and Meidia, Hira and Mahajan, S (2004) Quantum well state of self-forming 3C−SiC inclusions in 4H SiC determined by ballistic electron emission microscopy. Physical Review B, 69 (4). ISSN 2469-9969

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Abstract

High-temperature-processing-induced double-stacking-fault 3C−SiC inclusions in 4H SiC were studied with ballistic electron emission microscopy in ultrahigh vacuum. Distinctive quantum well structures corresponding to individual inclusions were found and the quantum well two-dimensional conduction band minimum was determined to be approximately 0.53±0.06eV below the conduction band minimum of bulk 4H SiC. Macroscopic diode I−V measurements indicate no significant evidence of metal/semiconductor interface state variation across the inclusions.

Item Type: Article
Subjects: 500 Science and Mathematic > 500 Science > 507 Education, Research, Related Topics
500 Science and Mathematic > 530 Physics > 530 Physics
Divisions: Faculty of Engineering & Informatics > Computer Engineering
Depositing User: Administrator UMN Library
Date Deposited: 06 Dec 2021 14:36
Last Modified: 27 Jan 2022 03:28
URI: https://kc.umn.ac.id/id/eprint/19363

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